Visible luminescence from silicon surfaces microstructured in air

We report visible luminescence from SiOx formed by microstructuring silicon surfaces with femtosecond laser pulses in air. Incorporation of oxygen into the silicon lattice occurs only where the laser beam strikes the surface. Laser microstructuring therefore offers the possibility of writing submicrometer luminescent features without lithographic masks. The amount of oxygen incorporated into the silicon surface depends on the laser fluence; the peak wavelength of the primary luminescence band varies between 540 and 630 nm and depends on the number of laser shots. Upon annealing, the intensity of the primary luminescence band increases significantly without any change in the luminescence peak wavelength, suggesting that the luminescence comes from defects rather than quantum confinement. (C) 2002 American Institute of Physics.