Dependence of the InAs size distribution on the stacked layer number for vertically stacked InAs/GaAs quantum dots

被引:20
作者
Lee, HS
Lee, JY
Kim, TW
Choo, DC
Kim, MD
Seo, SY
Shin, JH
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Yuseong Ku, Taejon 305701, South Korea
[2] Kwangwoon Univ, Dept Phys, Nowoon Ku, Seoul 139701, South Korea
[3] Samsung Elect, Div Optoelect, Suwon 442742, South Korea
[4] Korea Adv Inst Sci & Technol, Dept Phys, Yuseong Ku, Taejon 305701, South Korea
关键词
characterization; molecular beam epitaxy; semiconducting III-V materials;
D O I
10.1016/S0022-0248(02)01252-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Atomic force microscope (AFM), transmission electron microscopy (TEM), and photoluminescence measurements were carried out to investigate the dependence of the InAs quantum dot size distribution on the stacked layer number for vertically stacked InAs/GaAs quantum dots (QDs) grown on (0 0 1) GaAs substrates. AFM and TEM images showed that the size of the QDs increased with increase in the stacked layer number up to the deposition time of 20 s. However, the size distribution uniformity of the QDs was improved with increase in the stacked layer number when the deposition time and the stacking layer of the InAs QDs gradually decreased. These results can help in an improved understanding of the control of sizes of QDs in InAs/GaAs QD arrays. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:63 / 68
页数:6
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