Effect of substrate temperature on the physical properties of DC reactive magnetron sputtered ZnO films

被引：36

作者：

Subramanyam, TK ^{[1
]}

Naidu, BS ^{[1
]}

Uthanna, S ^{[1
]}

机构：

[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India

来源：

OPTICAL MATERIALS | 1999年 / 13卷 / 02期

关键词：

D O I：

10.1016/S0925-3467(99)00070-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this investigation, zinc oxide films have been prepared by DC reactive magnetron sputtering. A systematic study has been made on the structure and electrical and optical properties of ZnO films as a function of substrate temperature in the range 548-723 K. The X-ray diffraction studies revealed that the films were polycrystalline in nature with wurtzite structure. Films with a minimum resistivity of 6.9 x 10(-2) Omega cm and high transparency of 83% have been achieved at a substrate temperature of 663 K. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：239 / 247

页数：9

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