Generation of O-2 and metalorganic cluster ion beams and its application to low-temperature thin oxide film formation

被引:2
作者
Akizuki, M [1 ]
Matsuo, J [1 ]
Harada, M [1 ]
Ogasawara, S [1 ]
Doi, A [1 ]
Yamada, I [1 ]
机构
[1] SANYO ELECT CO LTD,MICROELECT RES CTR,OOMORI,GIFU 50301,JAPAN
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1996年 / 217卷
关键词
metalorganic cluster ion beams; O-2 cluster ion beams;
D O I
10.1016/S0921-5093(96)10299-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High-current O-2 and N-2 cluster ion beams were formed through a Laval nozzle by the combination of He mixing and gas cooling. The cluster current of 320 nA was obtained from O-2 cluster ions whose mean cluster size was 7000. Consequently, the equivalent ion current was as high as 2.2 mA. The optimum He flow ratio to obtain the most intense cluster beams was lower than those reported. The high-current O-2 cluster ion beams were successfully applied to the low-temperature formation of high-quality SiO2 and PbO films. Generation of Ti(i-OC3H7)(4) cluster ion beams (1.7 nA) was also demonstrated with the He bubbling method for the first time.
引用
收藏
页码:78 / 81
页数:4
相关论文
共 18 条
  • [1] Low-damage surface treatment by gas cluster-ion beams
    Akizuki, M
    Harada, M
    Miyai, Y
    Doi, A
    Yamaguchi, T
    Matsuo, J
    Takaoka, GH
    Ascheron, CE
    Yamada, I
    [J]. SURFACE REVIEW AND LETTERS, 1996, 3 (01) : 891 - 895
  • [2] Low-temperature oxidation of silicon by O-2 cluster ion beams
    Akizuki, M
    Matsuo, J
    Ogasawara, S
    Harada, M
    Doi, A
    Yamada, I
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (2B): : 1450 - 1453
  • [3] AKIZUKI M, IN PRESS NUCL INSTRU
  • [4] STRAHLEN AUS KONDENSIERTEN ATOMEN UND MOLEKELN IM HOCHVAKUUM
    BECKER, EW
    BIER, K
    HENKES, W
    [J]. ZEITSCHRIFT FUR PHYSIK, 1956, 146 (03): : 333 - 338
  • [5] STRAHLEN AUS KONDENSIERTEM WASSERSTOFF, KONDENSIERTEM HELIUM UND KONDENSIERTEM STICKSTOFF IM HOCHVAKUUM
    BECKER, EW
    LOHSE, P
    KLINGELHOFER, R
    [J]. ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1962, A 17 (05): : 432 - &
  • [6] Falter H., 1970, INT J MASS SPECTROM, V4, P145
  • [7] CLUSTER FORMATION IN EXPANDING SUPERSONIC JETS - EFFECT OF PRESSURE, TEMPERATURE, NOZZLE SIZE, AND TEST GAS
    HAGENA, OF
    OBERT, W
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1972, 56 (05) : 1793 - &
  • [8] HAGENA OF, 1974, MOL BEAMS LOW DENSIT, P137
  • [9] MICROMACHINING WITH CLUSTER IONS
    HENKES, PRW
    KLINGELHOFER, R
    [J]. VACUUM, 1989, 39 (06) : 541 - 542
  • [10] Sputtering with gas cluster-ion beams
    Matsuo, J
    Akizuki, M
    Northby, J
    Takaoka, GH
    Yamada, I
    [J]. SURFACE REVIEW AND LETTERS, 1996, 3 (01) : 1017 - 1021