A Novel Approach to Addressable 4 Teradot/in.2 Patterned Media

被引:79
作者
Xiao, Shuaigang [1 ]
Yang, XiaoMin [1 ]
Park, Soojin [3 ]
Weller, Dieter [2 ]
Russell, Thomas P. [3 ]
机构
[1] Seagate Technol, Pittsburgh, PA 15222 USA
[2] Seagate Technol, Fremont, CA 94538 USA
[3] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
基金
美国国家科学基金会;
关键词
BLOCK-COPOLYMERS; GRAPHOEPITAXY; LITHOGRAPHY; ARRAYS;
D O I
10.1002/adma.200802087
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Stable addressable self-assembled dot arrays with an areal density of 1.3-3.8 teradot/in.(2) and a resolution enhancement of at least a factor of 4 are achieved by combining block copolymers (BCPs) in the strong segregation limit, which have spherical microdomains (see inset), with chemically nanopatterned surfaces. The SEM image at the edge of a BCP thin film shows a dense BCP array (see figure, bottom) and the nanopatterned substrate (top).
引用
收藏
页码:2516 / +
页数:5
相关论文
共 14 条
  • [1] Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers
    Cheng, Joy Y.
    Rettner, Charles T.
    Sanders, Daniel P.
    Kim, Ho-Cheol
    Hinsberg, William D.
    [J]. ADVANCED MATERIALS, 2008, 20 (16) : 3155 - 3158
  • [2] Fabrication of nanostructures with long-range order using block copolymer lithography
    Cheng, JY
    Ross, CA
    Thomas, EL
    Smith, HI
    Vancso, GJ
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (19) : 3657 - 3659
  • [3] Microdomain patterns from directional eutectic solidification and epitaxy
    De Rosa, C
    Park, C
    Thomas, EL
    Lotz, B
    [J]. NATURE, 2000, 405 (6785) : 433 - 437
  • [4] Block copolymer monolayer structure measured with scanning force microscopy moire patterns
    Hexemer, A
    Stein, GE
    Kramer, EJ
    Magonov, S
    [J]. MACROMOLECULES, 2005, 38 (16) : 7083 - 7089
  • [5] Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer
    Jung, Yeon Sik
    Ross, C. A.
    [J]. NANO LETTERS, 2007, 7 (07) : 2046 - 2050
  • [6] Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
    Kim, SO
    Solak, HH
    Stoykovich, MP
    Ferrier, NJ
    de Pablo, JJ
    Nealey, PF
    [J]. NATURE, 2003, 424 (6947) : 411 - 414
  • [7] Block copolymer lithography: Periodic arrays of similar to 10(11) holes in 1 square centimeter
    Park, M
    Harrison, C
    Chaikin, PM
    Register, RA
    Adamson, DH
    [J]. SCIENCE, 1997, 276 (5317) : 1401 - 1404
  • [8] OBSERVATION OF DISLOCATIONS IN METALS BY MEANS OF MOIRE PATTERNS ON ELECTRON MICROGRAPHS
    PASHLEY, DW
    MENTER, JW
    BASSETT, GA
    [J]. NATURE, 1957, 179 (4563) : 752 - 755
  • [9] Polymers on nanoperiodic, heterogeneous surfaces
    Rockford, L
    Liu, Y
    Mansky, P
    Russell, TP
    Yoon, M
    Mochrie, SGJ
    [J]. PHYSICAL REVIEW LETTERS, 1999, 82 (12) : 2602 - 2605
  • [10] Density multiplication and improved lithography by directed block copolymer assembly
    Ruiz, Ricardo
    Kang, Huiman
    Detcheverry, Francois A.
    Dobisz, Elizabeth
    Kercher, Dan S.
    Albrecht, Thomas R.
    de Pablo, Juan J.
    Nealey, Paul F.
    [J]. SCIENCE, 2008, 321 (5891) : 936 - 939