The ambipolar Auger coefficient: Measured temperature dependence in electron irradiated and highly injected n-type silicon

被引:31
作者
Jonsson, P [1 ]
Bleichner, H [1 ]
Isberg, M [1 ]
Nordlander, E [1 ]
机构
[1] BOFORS UWS AB SUTEC, S-58007 LINKOPING, SWEDEN
关键词
D O I
10.1063/1.364277
中图分类号
O59 [应用物理学];
学科分类号
摘要
From foe-carrier absorption measurements of spatially and temporally resolved excess carrier concentrations in the n-base of electron irradiated, low doped, highly injected p-i-n type diodes, the effective ambipolar lifetime has been extracted with respect to different injection levels and temperatures. By measuring lifetimes up to injection levels of 3 x 10(17) cm(-3), the ambipolar Auger coefficient C-a and its temperature dependence has been determined in the range of 300-420 K. In accordance with recent publications, the room temperature value of the Auger coefficient was found to be about three times higher than one of the most commonly used values. Further on, the ambipolar Auger coefficient is empirically estimated to vary with temperature as C-a(T)=1.1x10(-30)(T/300)(1.8), were T is the absolute temperature. Also the ambipolar diffusion coefficient has been investigated and compared with different models. The results are important and useful in simulation of high-injected silicon devices, i.e., solar cells and power devices. (C) 1997 American Institute of Physics.
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页码:2256 / 2262
页数:7
相关论文
共 40 条
[1]  
BALIGA BJ, 1987, MODERN POWER DEVICES, P211
[2]   EXTENSION OF THE OPEN-CIRCUIT VOLTAGE DECAY TECHNIQUE TO INCLUDE PLASMA-INDUCED BANDGAP NARROWING [J].
BANGHART, EK ;
GRAY, JL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (05) :1108-1114
[3]   A TIME-RESOLVED OPTICAL-SYSTEM FOR SPATIAL CHARACTERIZATION OF THE CARRIER DISTRIBUTION IN A GATE TURN-OFF THYRISTOR (GTO) [J].
BLEICHNER, H ;
NORDLANDER, E ;
ROSLING, M ;
BERG, S .
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1990, 39 (03) :473-478
[4]   Temperature and injection dependence of the Shockley-Read-Hall lifetime in electron irradiated n-type silicon [J].
Bleichner, H ;
Jonsson, P ;
Keskitalo, N ;
Nordlander, E .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (12) :9142-9148
[5]  
BLEICHNER H, 1993, ESSDERC '93 - PROCEEDINGS OF THE 23RD EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, P895
[6]   CARRIER MOBILITIES IN SILICON SEMI-EMPIRICALLY RELATED TO TEMPERATURE, DOPING AND INJECTION LEVEL [J].
DORKEL, JM ;
LETURCQ, P .
SOLID-STATE ELECTRONICS, 1981, 24 (09) :821-825
[7]   AUGER COEFFICIENTS FOR HIGHLY DOPED AND HIGHLY EXCITED SILICON [J].
DZIEWIOR, J ;
SCHMID, W .
APPLIED PHYSICS LETTERS, 1977, 31 (05) :346-348
[8]   AUGER RECOMBINATION IN MODULATED PHOTOREFLECTANCE CHARACTERIZATION OF SILICON-WAFERS [J].
FORGET, BC ;
FOURNIER, D ;
GUSEV, VE .
APPLIED PHYSICS LETTERS, 1992, 61 (19) :2341-2343
[9]  
Ghandhi S.K., 1977, Semiconductor Power Devices
[10]  
GREKHOV IV, 1980, SOV PHYS SEMICOND+, V14, P529