Passive-oxidation kinetics of SiC microparticles

被引:36
作者
Das, D
Farjas, J
Roura, P
机构
[1] Univ Girona, Dept Phys, GRMT, E-17071 Girona, Catalonia, Spain
[2] Ramakrishna Mission Residential Coll, Dept Phys, Kolkata 700103, India
关键词
D O I
10.1111/j.1151-2916.2004.tb07726.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We investigated the oxidation kinetics of SiC materials in the form of powders (average dimension 4 mum) in the temperature range 1100degrees-1500degreesC in dry air. The oxidation process was monitored through the relative mass gain in a thermobalance. As the specific surface area of the particles was measured, the recorded mass gain could be converted into the corresponding oxide thickness. The oxidation isotherms were fitted to a linear-parabolic equation, and the parabolic rate constant was evaluated. Up to 1400degreesC, temperature dependence can be described by a single activation energy of 179 kJ/mol, which increases in the 1400degrees-1500degreesC temperature range. These results are compared with the oxidation behavior of sintered polycrystalline and monocrystalline SiC materials.
引用
收藏
页码:1301 / 1305
页数:5
相关论文
共 19 条
[1]   OXIDATION-KINETICS OF HOT-PRESSED AND SINTERED ALPHA-SIC [J].
COSTELLO, JA ;
TRESSLER, RE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1981, 64 (06) :327-331
[2]   OXIDATION-KINETICS OF SILICON-CARBIDE CRYSTALS AND CERAMICS .1. IN DRY OXYGEN [J].
COSTELLO, JA ;
TRESSLER, RE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1986, 69 (09) :674-681
[3]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[4]   OXIDATION OF 6H-ALPHA SILICON-CARBIDE PLATELETS [J].
HARRIS, RCA .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1975, 58 (1-2) :7-9
[5]   ARXPS STUDIES OF SIO2-SIC INTERFACES AND OXIDATION OF 6H SIC SINGLE-CRYSTAL SI-(001) AND C-(001)OVER-BAR SURFACES [J].
HORNETZ, B ;
MICHEL, HJ ;
HALBRITTER, J .
JOURNAL OF MATERIALS RESEARCH, 1994, 9 (12) :3088-3094
[6]   EFFECTS OF OXYGEN PARTIAL PRESSURE ON THE OXIDATION OF SILICON CARBIDE [J].
JORGENSEN, PJ ;
WADSWORTH, ME ;
CUTLER, IB .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1960, 43 (04) :209-212
[7]   OXIDATION OF SILICON CARBIDE [J].
JORGENSEN, PJ ;
WADSWORTH, ME ;
CUTLER, IB .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1959, 42 (12) :613-616
[8]  
MIESKOWSKI DM, 1984, J AM CERAM SOC, V67, pC17
[9]   HIGH-TEMPERATURE PASSIVE OXIDATION OF CHEMICALLY VAPOR-DEPOSITED SILICON-CARBIDE [J].
NARUSHIMA, T ;
GOTO, T ;
HIRAI, T .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1989, 72 (08) :1386-1390
[10]  
Ogbuji LUJT, 1997, J AM CERAM SOC, V80, P1544, DOI 10.1111/j.1151-2916.1997.tb03014.x