Excimer laser ablation and etching - Making a mark in many applications

被引：18

作者：

Brannon, J

机构：

[1] IBM Almaden Research Center, San Jose, CA

来源：

IEEE CIRCUITS & DEVICES | 1997年 / 13卷 / 02期

关键词：

D O I：

10.1109/101.583607

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

[No abstract available]

引用

页码：11 / 18

页数：8

共 25 条

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