Metal-insulator transition at room temperature and infrared properties of Nd0.7Eu0.3NiO3 thin films

被引：31

作者：

Capon, F ^{[1
]}

Laffez, P ^{[1
]}

Bardeau, JF ^{[1
]}

Simon, P ^{[1
]}

Lacorre, P ^{[1
]}

Zaghrioui, M ^{[1
]}

机构：

[1] Univ Maine, Lab Phys Etat Condense, F-72085 Le Mans, France

来源：

APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 04期

关键词：

D O I：

10.1063/1.1493645

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nd0.7Eu0.3NiO3 thin films are deposited by rf sputtering and subsequent oxygen pressure annealing on (100) oriented silicon substrate. We characterize the thermochromic properties of films by measuring electrical transition, infrared transmittance, and reflectance. The thermochromic effect at room temperature is observed. Resistivity measurements exhibit a sharper hysteresis loop than is usually observed in NdNiO3 thin films. Infrared properties in the 8-14 mum wavelength range spectra reveal a contrast of 30% in reflectance and 55% in transmittance. (C) 2002 American Institute of Physics.

引用

页码：619 / 621

页数：3

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