Photoluminescence studies on radiation enhanced diffusion of dry-etch damage in GaAs and InP materials

被引:31
作者
Chen, CH [1 ]
Yu, DG [1 ]
Hu, EL [1 ]
Petroff, PM [1 ]
机构
[1] UNIV CALIF SANTA BARBARA,DEPT MAT,SANTA BARBARA,CA 93106
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期
关键词
D O I
10.1116/1.588750
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated the radiation enhanced diffusion of ion defects during reactive ion beam etching of GaAs and InP, using the multiple quantum well (MQW) probe technique. During low energy (sub-keV) Ar+ ion exposure, illumination with light of energy above the band gap can substantially reduce the photoluminescence efficiency of MQW samples, relative to those which were not laser illuminated; the degradation of luminescence efficiency increases with the intensity of the light. Illumination with light of energy below the band gap produces a slight increase in the damage profiles. The observation of enhanced defect diffusion due to optical radiation in our studies suggests that in ion-assisted etching of semiconductors, the generation of excess electron-hole pairs and their subsequent recombination can play an important role in the propagation of defects into the substrate. (C) 1996 American Vacuum Society.
引用
收藏
页码:3684 / 3687
页数:4
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