Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

被引:126
作者
Kessels, W. M. M. [1 ]
Knoops, H. C. M. [1 ]
Dielissen, S. A. F. [1 ]
Mackus, A. J. M. [1 ]
van de Sanden, M. C. M. [1 ]
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
关键词
PLATINUM; OXYGEN; PT(111);
D O I
10.1063/1.3176946
中图分类号
O59 [应用物理学];
学科分类号
摘要
Infrared spectroscopy was used to obtain absolute number information on the reaction products during atomic layer deposition of Pt from (methylcyclopentadienyl)trimethylplatinum [(MeCp)PtMe3] and O-2. From the detection of CO2 and H2O it was established that the precursor ligands are oxidatively decomposed during the O-2 pulse mainly. Oxygen atoms chemisorbed at the Pt lead to likewise ligand oxidation during the (MeCp)PtMe3 pulse however the detection of a virtually equivalent density of CO2 and CH4 also reveals a concurrent ligand liberation reaction. The surface coverage of chemisorbed oxygen atoms found is consistent with the saturation coverage reported in surface science studies. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3176946]
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页数:3
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