Plasma sources for electrons and ion beams

被引：11

作者：

Leung, KN ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.591063

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Plasma devices are commonly used for the production of ion beams. It has been demonstrated that the multicusp, generator can produce very low energy ion beams for ion projection lithography applications. The multicusp source has also found important applications in focused ion beam systems. With its high and uniform plasma density, attempts have been made to extract high brightness electron beams from this type of plasma source, making it also useful for electron beam lithography applications. (C) 1999 American Vacuum Society. [S0734-211X(99)0550617].

引用

页码：2776 / 2778

页数：3

共 9 条

[1]

BRUENGER WH, COMMUNICATION

[2] EFFECT OF A MAGNETIC FILTER ON THE FORMATION AND DEPOSITION OF HIGH-Z IMPURITIES IN A MULTICUSP ION-SOURCE [J].

EHLERS, KW ;

LEUNG, KN ;

PINCOSY, PA ;

VELLA, MC .

APPLIED PHYSICS LETTERS, 1982, 41 (06) :517-519

[3]

JI Q, COMMUNICATION

[4] Multicusp sources for ion beam projection lithography [J].

Lee, Y ;

Gough, RA ;

Kunkel, WB ;

Leung, KN ;

Vujic, J ;

Williams, MD ;

Wutte, D ;

Zahir, N .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (02) :877-879

[5] Plasma source for ion and electron beam lithography [J].

Lee, Y ;

Gough, RA ;

Leung, KN ;

Vujic, J ;

Williams, MD ;

Zahir, N ;

Fallman, W ;

Tockler, M ;

Bruenger, W .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3367-3369

[6] Axial energy spread measurements of an accelerated positive ion beam [J].

Lee, Y ;

Gough, RA ;

Kunkel, WB ;

Leung, KN ;

Perkins, LT ;

Pickard, DS ;

Sun, L ;

Vujic, J ;

Williams, MD ;

Wutte, D ;

Mondelli, AA ;

Stengl, G .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1997, 385 (02) :204-208

[7]

LEE Y, COMMUNICATION

[8] Radio frequency driven multicusp sources (invited) [J].

Leung, KN .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (02) :998-1002

[9] Multicusp sources for ion beam lithography applications [J].

Leung, KN ;

Herz, P ;

Kunkel, WB ;

Lee, Y ;

Perkins, L ;

Pickard, D ;

Sarstedt, M ;

Weber, M ;

Williams, MD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2600-2602

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