Pulsed laser ablation deposition of thin films on large substrates

被引:20
作者
Acquaviva, S [1 ]
Fernández, M
Leggieri, G
Luches, A
Martino, M
Perrone, A
机构
[1] Ist Nazl Fis Mat, I-73100 Lecce, Italy
[2] Univ Lecce, Dept Phys, I-73100 Lecce, Italy
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 69卷 / Suppl 1期
关键词
PACS: 81.15.Fg; 67.70; 81.05.Je;
D O I
10.1007/s003390051442
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have designed and built an ultra-high vacuum chamber which allows thin film deposition on large area (up to 100 mm diameter) flat substrates and on three-dimensional substrates (e.g. 100 mm long, 50 mm diameter cylinders) by the pulsed laser deposition and reactive pulsed laser deposition techniques. Heating of substrates during and after film deposition is possible using either resistive heaters or a lamp array. Metal (Cu) and metal nitride (TiN) and carbide (TiC) films were deposited on Si wafers (60 and 100 mm diameter), three-dimensional steel substrates (steel cylinders and screws), Teflon plates, and paper sheets.
引用
收藏
页码:S471 / S474
页数:4
相关论文
共 12 条
[1]   LASER ABLATION OF GE IN AN OXYGEN ENVIRONMENT - PLASMA AND FILM PROPERTIES [J].
AFONSO, CN ;
VEGA, F ;
SOLIS, J ;
CATALINA, F ;
ORTEGA, C ;
SIEJKA, J .
APPLIED SURFACE SCIENCE, 1992, 54 :175-179
[2]   Superconducting properties of epitaxial laser ablated thin films [J].
Berling, D ;
DelVecchio, A ;
Leggieri, G ;
Loegel, B ;
Luches, A ;
Mehdaoui, A ;
Tapfer, L .
SOLID STATE COMMUNICATIONS, 1996, 97 (08) :657-661
[3]   SYNTHESIS OF THIN-FILMS OF SEMICONDUCTOR AND REFRACTORY-METAL NITRIDES BY LASER IRRADIATION OF SOLID SAMPLES IN AMBIENT GASES [J].
DANNA, E ;
LEGGIERI, G ;
LUCHES, A .
THIN SOLID FILMS, 1992, 218 (1-2) :219-230
[4]   Deposition of C-N films by reactive laser ablation [J].
DAnna, E ;
Luches, A ;
Perrone, A ;
Acquaviva, S ;
Alexandrescu, R ;
Mihailescu, IN ;
Zemek, J ;
Majni, G .
APPLIED SURFACE SCIENCE, 1996, 106 :126-131
[5]   Optical emission spectroscopy of molecular species in plasma induced by laser ablation of carbon in nitrogen [J].
Dinescu, G ;
Aldea, E ;
De Giorgi, ML ;
Luches, A ;
Perrone, A ;
Zocco, A .
APPLIED SURFACE SCIENCE, 1998, 127 :697-702
[6]   LARGE-AREA PULSED-LASER DEPOSITION - TECHNIQUES AND APPLICATIONS [J].
GREER, JA ;
TABAT, MD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1175-1181
[7]   Vacuum-ultraviolet pulsed-laser deposition of silicon dioxide thin films [J].
Jackson, BD ;
Herman, PR .
APPLIED SURFACE SCIENCE, 1998, 127 :595-600
[8]   OXIDE SUPERCONDUCTOR AND MAGNETIC METAL THIN-FILM DEPOSITION BY PULSED-LASER ABLATION - A REVIEW [J].
JACKSON, TJ ;
PALMER, SB .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (08) :1581-1594
[9]   DEPOSITION OF HIGH-QUALITY TIN FILMS BY EXCIMER-LASER ABLATION IN REACTIVE GAS [J].
MIHAILESCU, IN ;
CHITICA, N ;
NISTOR, LC ;
POPESCU, M ;
TEODORESCU, VS ;
URSU, I ;
ANDREI, A ;
BARBORICA, A ;
LUCHES, A ;
DEGIORGI, ML ;
PERRONE, A ;
DUBREUIL, B ;
HERMANN, J .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (09) :5781-5789
[10]   Growth of p-type ZnTe and n-type CdSe films on GaAs(001) by pulsed laser ablation [J].
Rouleau, CM ;
Lowndes, DH .
APPLIED SURFACE SCIENCE, 1998, 127 :418-424