Effect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O-3 films by DC magnetron reactive sputtering

被引：14

作者：

Kim, ST ^{[1
]}

Kim, HH ^{[1
]}

Kim, YI ^{[1
]}

Lee, MY ^{[1
]}

Lee, WJ ^{[1
]}

机构：

[1] KOREA ADV INST SCI & TECHNOL,DEPT MAT SCI & ENGN,TAEJON 305701,SOUTH KOREA

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 9A期

关键词：

lead zirconate titanate; thin film; sputtering; ECR plasma;

D O I：

10.1143/JJAP.36.5663

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Pb(Zr,Ti)O-3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O-3 films With stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2/Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.

引用

页码：5663 / 5669

页数：7

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