Resistive switching mechanisms of V-doped SrZrO3 memory films

被引:89
作者
Lin, Chun-Chieh [1 ]
Tu, Bing-Chung
Lin, Chao-Cheng
Lin, Chen-Hsi
Tseng, Tseung-Yuen
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
[3] Windbond Elect Corp, Hsinchu 300, Taiwan
关键词
conduction mechanism; nonvolatile memory (NVM); resistive random access memory (RRAM); resistive switching; SrZrO3;
D O I
10.1109/LED.2006.880660
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The resistive switching behaviors of sputtered V-doped SrZrO3 (V:SZO) memory films were investigated in this letter. The current states of the memory films were switched between high current state (H-state) and low current state (L-state). The resistance ratio of the two current states was over 1000 at a read voltage. The switching mechanism from L- to H-state corresponds to the formation of current paths. However, this mechanism from H- to L-state is thought to be due to the fact that the defects present in the V:SZO film randomly trap electrons, and hence, the current paths are ruptured. The conduction mechanism of the H-state is dominated by ohmic conduction, whereas the L-state conduction is dominated by Frenkel-Poole emission. The polarity direction of the resistive switching is an intrinsic property of the SrZrO3 oxides. The V:SZO films with high uniformity and good stability are expected to be used in nonvolatile memory.
引用
收藏
页码:725 / 727
页数:3
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