Imaging characteristics of poly(methyl methacrylate) at vacuum ultraviolet wavelengths

被引:9
作者
Ferincz, IE
Toth, C
Young, JF
机构
[1] RICE UNIV,DEPT ELECT & COMP ENGN,HOUSTON,TX 77251
[2] RICE UNIV,RICE QUANTUM INST,HOUSTON,TX 77251
[3] HUNGARIAN ACAD SCI,SOLID STATE PHYS RES INST,H-1525 BUDAPEST,HUNGARY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 04期
关键词
D O I
10.1116/1.589493
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the depth versus exposure characteristics of poly(methyl methacrylate) (PMMA) in the vacuum ultraviolet (VUV) region from 59 to 128 nm. Calculated absorption coefficients of the PMMA are also presented. The depth of the features on the PMMA were in the range of 20-80 nm created by 1-50 mJ cm(-2) exposures and were measured with an atomic force microscope (AFM). We found that the AFM can reliably measure depth differences of only 2 nm, The sensitivity of the AFM permits exposures to be reduced for high resolution microscopy and holography even in the case of highly absorbing films. (C) 1997 American Vacuum Society.
引用
收藏
页码:828 / 832
页数:5
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