NEW HIGH-CONTRAST DEVELOPERS FOR POLY(METHYL METHACRYLATE) RESIST

被引：76

作者：

BERNSTEIN, GH

HILL, DA

LIU, WP

机构：

[1] UNIV NOTRE DAME,DEPT CHEM ENGN,NOTRE DAME,IN 46556

[2] ARIZONA STATE UNIV,CTR SOLID STATE ELECTR RES,TEMPE,AZ 85287

来源：

JOURNAL OF APPLIED PHYSICS | 1992年 / 71卷 / 08期

关键词：

D O I：

10.1063/1.350831

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

New developers for poly(methyl methacrylate) consisting of mixtures of common developing components have been carefully investigated. It has been found that adding a small percentage of methyl ethyl ketone to methyl isobutyl ketone and Cellosolve results in a significant increase in contrast. Results of contrast experiments as well as improvements in electron-beam lithographic exposures are reported. An explanation of the mechanism of contrast and resolution enhancement is offered.

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页码：4066 / 4075

页数：10

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