Inkjet-Printed High Mobility Transparent-Oxide Semiconductors

被引:61
作者
Han, Seung-Yeol [1 ]
Lee, Doo-Hyoung [1 ]
Herman, Gregory S. [2 ]
Chang, Chih-Hung [1 ]
机构
[1] Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA
[2] Hewlett Packard Corp, Corvallis, OR USA
来源
JOURNAL OF DISPLAY TECHNOLOGY | 2009年 / 5卷 / 12期
基金
美国国家科学基金会;
关键词
Inkjet printing; solution-based process; thin-film transistors (TFTs); transparent oxide semiconductors; THIN-FILM TRANSISTORS; HIGH-PERFORMANCE; TEMPERATURE FABRICATION;
D O I
10.1109/JDT.2009.2024330
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we report a general and low-cost process to fabricate high mobility metal-oxide semiconductors that is suitable for thin-film electronics. This process use simple metal halide precursors dissolved in an organic solvent and is capable of forming uniform and continuous thin films via inkjet-printing or spin-coating process. This process has been demonstrated to deposit a variety of semiconducting metal oxides include binary oxides (ZnO, In2O3, SnO2 Ga2O3), ternary oxides (ZIO, ITO, ZTO, IGO) and quaternary compounds (IZTO, IGZO). Functional thin film transistors with high field-effect mobility were fabricated successfully using channel layers deposited from this process. This synthetic pathway opens an avenue to form patterned metal oxide semiconductors through a simple and low-cost process and to fabricate high performance transparent thin film electronics via digital fabrication processes on large substrates.
引用
收藏
页码:520 / 524
页数:5
相关论文
共 26 条
[1]   High-performance, solution-processed organic thin film transistors from a novel pentacene precursor [J].
Afzali, A ;
Dimitrakopoulos, CD ;
Breen, TL .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2002, 124 (30) :8812-8813
[2]  
ARIAS AC, 2005, 229 ACS NAT M SAN DI, pU1128
[3]   High-performance, spin-coated zinc tin oxide thin-film transistors [J].
Chang, Y. -J. ;
Lee, D. -H. ;
Herman, G. S. ;
Chang, C. -H. .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2007, 10 (05) :H135-H138
[4]   Transparent ZnO thin film transistor fabricated by sol-gel and chemical bath deposition combination method [J].
Cheng, Hua-Chi ;
Chen, Chia-Fu ;
Tsay, Chien-Yie .
APPLIED PHYSICS LETTERS, 2007, 90 (01)
[5]   Thin-film transistors with amorphous indium gallium oxide channel layers [J].
Chiang, H. Q. ;
Hong, D. ;
Hung, C. M. ;
Presley, R. E. ;
Wager, John F. ;
Park, C. -H ;
Keszler, D. A. ;
Herman, G. S. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06) :2702-2705
[6]  
Choi Y, 2008, COMB CHEM HIGH T SCR, V11, P1
[7]   Fully transparent ZnO thin-film transistor produced at room temperature [J].
Fortunato, EMC ;
Barquinha, PMC ;
Pimentel, ACMBG ;
Gonçalves, AMF ;
Marques, AJS ;
Pereira, LMN ;
Martins, RFP .
ADVANCED MATERIALS, 2005, 17 (05) :590-+
[8]   Ink-jet printed nanoparticle microelectromechanical systems [J].
Fuller, SB ;
Wilhelm, EJ ;
Jacobson, JM .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2002, 11 (01) :54-60
[9]   ZnO-based transparent thin-film transistors [J].
Hoffman, RL ;
Norris, BJ ;
Wager, JF .
APPLIED PHYSICS LETTERS, 2003, 82 (05) :733-735
[10]   Inkjet printed copper source/drain metallization for amorphous silicon thin-film transistors [J].
Hong, CM ;
Wagner, S .
IEEE ELECTRON DEVICE LETTERS, 2000, 21 (08) :384-386