Transport properties of Be- and Si-doped AlSb

被引:17
作者
Bennett, BR [1 ]
Moore, WJ [1 ]
Yang, MJ [1 ]
Shanabrook, BV [1 ]
机构
[1] USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA
关键词
D O I
10.1063/1.373470
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thick epitaxial layers of AlSb(Si) and AlSb(Be) were grown by molecular beam epitaxy and characterized by variable-temperature Hall/van der Pauw measurements. Si is shown to be predominantly an acceptor in AlSb, with an energy level 33 +/- 4 meV above the top of the valence band. Be is also an acceptor, with an energy level 38 +/- 4 meV above the top of the valence band. Be is a robust doping source for p-AlSb for carrier densities ranging from 10(15) to 10(19) cm(-3). Background impurity levels in AlSb can be assessed by measuring the transport properties of lightly doped AlSb(Be) layers. (C) 2000 American Institute of Physics. [S0021- 8979(00)00811-2].
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收藏
页码:7876 / 7879
页数:4
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