Transport properties of highly conductive n-type Al-rich AlxGa1-xN (x≥0.7)

被引:119
作者
Nakarmi, ML [1 ]
Kim, KH [1 ]
Zhu, K [1 ]
Lin, JY [1 ]
Jiang, HX [1 ]
机构
[1] Kansas State Univ, Dept Phys, Manhattan, KS 66506 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1809272
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report here the growth and transport studies of conductive n-type AlxGa1-xN alloys with high Al contents (xgreater than or equal to0.7). Si-doped AlxGa1-xN alloys were grown by metalorganic chemical vapor deposition on AlN-epilayer/sapphire substrates with very smooth surface. Low n-type resistivities have been obtained for Al-rich AlxGa1-xN alloys. The resistivity was observed to increase rapidly with increasing x due to the deepening of the Si donor energy level. Transport measurements have indicated that we have achieved n-type conduction in pure AlN. From the temperature dependence of the resistivity, the donor activation energy was estimated to vary from 23 to 180 meV as x was increased from 0.7 to 1.0. (C) 2004 American Institute of Physics.
引用
收藏
页码:3769 / 3771
页数:3
相关论文
共 20 条
[1]   Improved dc characteristics of AlGaN/GaN high-electron-mobility transistors on AlN/sapphire templates [J].
Arulkumaran, S ;
Sakai, M ;
Egawa, T ;
Ishikawa, H ;
Jimbo, T ;
Shibata, T ;
Asai, K ;
Sumiya, S ;
Kuraoka, Y ;
Tanaka, M ;
Oda, O .
APPLIED PHYSICS LETTERS, 2002, 81 (06) :1131-1133
[2]   The promise and challenge of solid-state lighting [J].
Bergh, A ;
Craford, G ;
Duggal, A ;
Haitz, R .
PHYSICS TODAY, 2001, 54 (12) :42-47
[3]   Metalorganic chemical vapor deposition of highly conductive Al0.65Ga0.35N films [J].
Cantu, P ;
Keller, S ;
Mishra, UK ;
DenBaars, SP .
APPLIED PHYSICS LETTERS, 2003, 82 (21) :3683-3685
[4]   Improved performance of 325-nm emission AlGaN ultraviolet light-emitting diodes [J].
Chitnis, A ;
Zhang, JP ;
Adivarahan, V ;
Shatalov, M ;
Wu, S ;
Pachipulusu, R ;
Mandavilli, V ;
Khan, MA .
APPLIED PHYSICS LETTERS, 2003, 82 (16) :2565-2567
[5]  
Jahnen B, 1998, MRS INTERNET J N S R, V3, part. no.
[6]   III-nitride ultraviolet light-emitting diodes with delta doping [J].
Kim, KH ;
Li, J ;
Jin, SX ;
Lin, JY ;
Jiang, HX .
APPLIED PHYSICS LETTERS, 2003, 83 (03) :566-568
[7]  
Lakowicz J.R., 2004, PRINCIPLES FLUORESCE, V3rd
[8]   Optical and electrical properties of Al-rich AlGaN alloys [J].
Li, J ;
Nam, KB ;
Lin, JY ;
Jiang, HX .
APPLIED PHYSICS LETTERS, 2001, 79 (20) :3245-3247
[9]   Point-defect complexes and broadband luminescence in GaN and AlN [J].
Mattila, T ;
Nieminen, RM .
PHYSICAL REVIEW B, 1997, 55 (15) :9571-9576
[10]   Photoluminescence studies of Si-doped AlN epilayers [J].
Nam, KB ;
Nakarmi, ML ;
Li, J ;
Lin, JY ;
Jiang, HX .
APPLIED PHYSICS LETTERS, 2003, 83 (14) :2787-2789