Characterization of Ti(NxOy) coatings produced by the arc ion plating method

被引:47
作者
Makino, Y
Tanaka, T
Nose, M
Misawa, M
Tanimoto, A
Nakai, T
Kato, K
Nogi, K
机构
[1] Osaka Univ, Joining & Welding Res Inst, Osaka 567, Japan
[2] Takaoka Natl Coll, Toyama 933, Japan
[3] Precess Technol Res Inst Nagano Prefecture, Nagano 394, Japan
[4] Osaka Electrocommun Univ, Osaka 572, Japan
关键词
Ti(NxOy); arc ion plating; lattice constant; preferential orientation; internal stress; hardness;
D O I
10.1016/S0257-8972(97)00309-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of oxygen addition to TIN was investigated by producing oxynitride films with the are ion plating method. These titanium oxynitride films were identified to be NaCl(B1) structure by XRD measurements with theta-2 theta and glancing angle methods. By increasing the content of oxygen in the deposited films, the preferential orientation of the films changed from the [111] direction to the [200] direction, and the existence of titanium ions with a higher valence, such as Ti3+ and Ti4+ as well as divalent titanium, in the deposited films was indicated by the change of Ti-2p photoelectron spectra. From the result on Vickers hardness, it was also indicated that suitable addition of oxygen to TiN is preferable to improve the hardness of the TiN films. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:934 / 938
页数:5
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