Temperature-dependent La- and Al-induced dipole behavior monitored by femtosecond pump/probe photoelectron spectroscopy

被引：24

作者：

Arimura, Hiroaki ^{[1
]}

Haight, Richard ^{[2
]}

Brown, Stephen L. ^{[2
]}

Kellock, Andrew ^{[3
]}

Callegari, Alessandro ^{[2
]}

Copel, Matthew ^{[2
]}

Watanabe, Heiji ^{[1
]}

Narayanan, Vijay ^{[2
]}

Ando, Takashi ^{[1
,2
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Suita, Osaka 5650871, Japan

[2] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA

[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

APPLIED PHYSICS LETTERS | 2010年 / 96卷 / 13期

关键词：

aluminium compounds; annealing; dielectric materials; high-speed optical techniques; lanthanum compounds; photoelectron spectra; silicon compounds;

D O I：

10.1063/1.3374883

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The impact of thermal budget on La- and Al-induced dipoles is systematically investigated by femtosecond pump/probe photoelectron spectroscopy. We find that the La-induced dipole requires annealing at 300 degrees C for complete activation, whereas the Al-induced dipole is activated at the lower temperature but requires annealing at 300 degrees C to eliminate a counteracting sheet charge. When La and Al atoms coexist on a SiO2 surface, the La-induced dipole becomes dominative after a silicate-forming reaction at the temperature above 600 degrees C. This phenomenon is attributed to the different natures of the La- and Al-induced dipoles, i.e., long-range and short-range.

引用

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