4.0-inch Active-Matrix Organic Light-Emitting Diode Display Integrated with Driver Circuits Using Amorphous In-Ga-Zn-Oxide Thin-Film Transistors with Suppressed Variation

被引:47
作者
Ohara, Hiroki [1 ]
Sasaki, Toshinari [1 ]
Noda, Kousei [1 ]
Ito, Shunichi [1 ]
Sasaki, Miyuki [1 ]
Endo, Yuta [1 ]
Yoshitomi, Shuhei [1 ]
Sakata, Junichiro [1 ]
Serikawa, Tadashi [1 ]
Yamazaki, Shunpei [1 ]
机构
[1] Semicond Energy Lab Co Ltd, Kanagawa 2430036, Japan
关键词
HOMOLOGOUS COMPOUNDS; PAPER;
D O I
10.1143/JJAP.49.03CD02
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have newly developed a 4.0-in. quarter video graphics array (QVGA) active-matrix organic light-emitting diode (AMOLED) display integrated with gate and source driver circuits using amorphous In-Ga-Zn-oxide (IGZO) thin-film transistors (TFTs). Focusing on a passivation layer in an inverted staggered bottom gate structure, the threshold voltage of the TFTs can be controlled to have "normally-off'' characteristics with suppressed variation by using a SiOx layer formed by sputtering with a low hydrogen content. In addition, small subthreshold swing S/S of 0.19 V/decade, high field-effect mobility mu(FE) of 11.5 cm(2) V-1 s(-1), and threshold voltage V-th of 1.27 V are achieved. The deposition conditions of the passivation layer and other processes are optimized, and variation in TFT characteristics is suppressed, whereby high-speed operation in gate and source driver circuits can be achieved. Using these driver circuits, the 4.0-in. QVGA AMOLED display integrated with driver circuits can be realized. (C) 2010 The Japan Society of Applied Physics
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页数:6
相关论文
共 21 条
[1]   Amorphous In-Ga-Zn-O Thin Film Transistor Current-Scaling Pixel Electrode Circuit for Active-Matrix Organic Light-Emitting Displays [J].
Chen, Charlene ;
Abe, Katsumi ;
Fung, Tze-Ching ;
Kumomi, Hideya ;
Kanicki, Jerzy .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (03)
[2]   Instability of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors under Light Illumination [J].
Gosain, Dharam Pal ;
Tanaka, Tsutomu .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (03)
[3]   Circuits using uniform TFTs based on amorphous In-Ga-Zn-O [J].
Hayashi, Ryo ;
Ofuji, Masato ;
Kaji, Nobuyuki ;
Takahashi, Kenji ;
Abe, Katsumi ;
Yabuta, Hisato ;
Sano, Masafumi ;
Kumomi, Hideya ;
Nomura, Kenji ;
Kamiya, Toshio ;
Hirano, Masahiro ;
Hosono, Hideo .
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2007, 15 (11) :915-921
[4]  
Hoffman R, 2009, 2009 SID INTERNATIONAL SYMPOSIUM DIGEST OF TECHNICAL PAPERS, VOL XL, BOOKS I - III, P288
[5]  
Jeong JK, 2008, SID INT SYMP DIG TEC, V39, P1
[6]   High performance thin film transistors with cosputtered amorphous indium gallium zinc oxide channel [J].
Jeong, Jae Kyeong ;
Jeong, Jong Han ;
Yang, Hui Won ;
Park, Jin-Seong ;
Mo, Yeon-Gon ;
Kim, Hye Dong .
APPLIED PHYSICS LETTERS, 2007, 91 (11)
[7]  
Jin DU, 2009, 2009 SID INTERNATIONAL SYMPOSIUM DIGEST OF TECHNICAL PAPERS, VOL XL, BOOKS I - III, P983
[8]   Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules [J].
Kang, Donghun ;
Lim, Hyuck ;
Kim, Changjung ;
Song, Ihun ;
Park, Jaechoel ;
Park, Youngsoo ;
Chung, JaeGwan .
APPLIED PHYSICS LETTERS, 2007, 90 (19)
[9]   Invited paper: Technological challenges for large-size AMOLED display [J].
Kim, Hye Dong ;
Jeong, Jae Kyeong ;
Chung, Hyun-Joong ;
Mo, Yeon-Gon .
2008 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXIX, BOOKS I-III, 2008, 39 :291-294
[10]  
KIM S, 2008, P 214 ECS M, P2317