Effect of excess bismuth on the microstructures and electrical properties of strontium bismuth tantalate (SBT) thin films

被引:29
作者
Li, AD [1 ]
Wu, D
Ling, HQ
Yu, T
Wang, M
Yin, XB
Liu, ZG
Ming, NB
机构
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210093, Peoples R China
[3] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
关键词
ferroelectric properties; structure properties; electrical properties and measurements;
D O I
10.1016/S0040-6090(00)01240-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Strontium bismuth tantalate (SBT) films with excess Bi contents were prepared on Pt/TiO2/SiO2/Si substrates by a metallorganic decomposition technique. Effect of excess Bi contents on the microstructure and electrical properties were investigated. A predominant layered perovskite structure could be formed when an excess Bi less than 30% was added. For films above 30% excess of Bi, secondary phases occurred. The remnant polarization and dielectric constant decreased with excess Bi content. This was attributed to a smaller grain size and the presence of secondary phases. The leakage current characteristics were also examined. Space charge limited mechanism was observed in SBT films. In summary, 10% excess Bi was found to be the optimum composition with respect to grain size, morphology, and electrical properties. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:215 / 219
页数:5
相关论文
共 12 条
[1]   PREPARATION AND FERROELECTRIC PROPERTIES OF SRBI2TA2O9 THIN-FILMS [J].
AMANUMA, K ;
HASE, T ;
MIYASAKA, Y .
APPLIED PHYSICS LETTERS, 1995, 66 (02) :221-223
[2]   PREPARATION OF BI-BASED FERROELECTRIC THIN-FILMS BY SOL-GEL METHOD [J].
ATSUKI, T ;
SOYAMA, N ;
YONEZAWA, T ;
OGI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B) :5096-5099
[3]   The effect of excess bismuth on the ferroelectric properties of SrBi2Ta2O9 thin films [J].
Chen, TC ;
Li, TK ;
Zhang, XB ;
Desu, SB .
JOURNAL OF MATERIALS RESEARCH, 1997, 12 (06) :1569-1575
[4]   Oriented growth of SrBi2Ta2O9 ferroelectric thin films [J].
Desu, SB ;
Vijay, DP ;
Zhang, X ;
He, BP .
APPLIED PHYSICS LETTERS, 1996, 69 (12) :1719-1721
[5]   New low temperature processing of sol-gel SrBi2Ta2O9 thin films [J].
Ito, Y ;
Ushikubo, M ;
Yokoyama, S ;
Matsunaga, H ;
Atsuki, T ;
Yonezawa, T ;
Ogi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (9B) :4925-4929
[6]   Effect of annealing method to crystalize on Sr0.9Bi2.3Ta2O9+α thin film properties formed from alkoxide solution [J].
Koiwa, I ;
Tani, K ;
Mita, J ;
Iwabuchi, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (01) :192-197
[7]   FERROELECTRIC MEMORIES [J].
SCOTT, JF ;
DEARAUJO, CAP .
SCIENCE, 1989, 246 (4936) :1400-1405
[8]   Structure and device characteristics of SrBi2Ta2O9-based nonvolatile random-access memories [J].
Scott, JF ;
Ross, FM ;
deAraujo, CAP ;
Scott, MC ;
Huffman, M .
MRS BULLETIN, 1996, 21 (07) :33-39
[9]   Oxide interfacial phases and the electrical properties of SrBi2Ta2O9 thin films prepared by plasma-enhanced metalorganic chemical vapor deposition [J].
Seong, NJ ;
Yang, CH ;
Shin, WC ;
Yoon, SG .
APPLIED PHYSICS LETTERS, 1998, 72 (11) :1374-1376
[10]   Structural and ferroelectric properties of the c-axis oriented SrBi2Ta2O9 thin films deposited by the radio-frequency magnetron sputtering [J].
Song, TK ;
Lee, JK ;
Jung, HJ .
APPLIED PHYSICS LETTERS, 1996, 69 (25) :3839-3841