Optical properties of GaN grown over SiO2 on SiC substrates by molecular beam epitaxy

被引:19
作者
Torvik, JT [1 ]
Pankove, JI
Iliopoulos, E
Ng, HM
Moustakas, TD
机构
[1] Astralux Inc, Boulder, CO 80301 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[3] Boston Univ, Ctr Photon Res, Boston, MA 02215 USA
关键词
D O I
10.1063/1.120698
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the optical properties of GaN grown over SiO2 on SiC substrates by electron cyclotron resonance assisted molecular beam epitaxy. The photoluminescence spectra and refractive index of GaN were compared for GaN/SiO2/SiC and GaN/SiC. Strong band-edge luminescence was observed at 3.40 eV from the GaN on both SiO2/SiC and on SiC. No defect-related yellow luminescence was observed. The refractive index of GaN at 1.96 eV (632.8 nm) was measured at 2.22 and 2.24 for GaN/SiO2/SiC and GaN/SiC, respectively. (C) 1998 American Institute of Physics.
引用
收藏
页码:244 / 245
页数:2
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