Effects of ion beam energy on the formation of cubic boron nitride thin films by pulsed Nd:YAG laser deposition

被引：6

作者：

Kawasaki, H ^{[1
]}

Doi, K ^{[1
]}

Hiraishi, S ^{[1
]}

Suda, Y ^{[1
]}

机构：

[1] Sasebo Natl Coll Technol, Dept Elect Engn, Nagasaki 8571193, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 7B期

关键词：

pulsed laser deposition; cubic boron nitride; thin films; ion beam;

D O I：

10.1143/JJAP.39.4525

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Cubic boron nitride (cBN) thin films are synthesized on Si(100) substrates by a pulsed neodymium: yttrium-aluminum-garnet (Nd:YAG) laser deposition method using an ion beam in order to enhance the synthesis of the cBN phase. The deposited films were characterized by a Fourier transform infrared (FT-IR) measurement method. When a pure N-2 ion beam is used, some absorption peaks for hexagonal boron nitride (hBN) are visible, but the peak for cBN cannot be observed. When argon(ar) gas is mixed with the reactant nitrogen(N-2) gas, the peak at 1050 cm(-1) for cBN appears, in addition to those of hBN. When the ion-beam current and voltage is increased to 20 mA and 400 V, the absorption peak intensity for cBN increases, and that of hBN disappears. These results suggest that nitrogen and argon ion bombardment plays an important role in the formation of cBN films.

引用

页码：4525 / 4527

页数：3

共 14 条

[1] Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition [J].

Chattopadhyay, KK ;

Matsumoto, S ;

Zhang, YF ;

Sakaguchi, I ;

Nishitani-Gamo, M ;

Ando, T .

THIN SOLID FILMS, 1999, 354 (1-2) :24-28

[2] DEPOSITION OF BORON-NITRIDE FILMS BY NITROGEN SPUTTERING FROM A BORON-METAL TARGET [J].

JENSEN, H ;

JENSEN, UM ;

SORENSEN, G .

APPLIED PHYSICS LETTERS, 1995, 66 (12) :1489-1491

[3] COMPOSITION OF EVAPORATED BORON-NITRIDE FILMS BY CARBON-DIOXIDE AND EXCIMER-LASER [J].

KANEDA, K ;

SHIBATA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12A) :5652-5655

[4] PHASE-CONTROL OF CUBIC BORON-NITRIDE THIN-FILMS [J].

KESTER, DJ ;

MESSIER, R .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (02) :504-513

[5] GROWTH OF CUBIC BN FILMS ON BETA-SIC BY ION-ASSISTED PULSED-LASER DEPOSITION [J].

MIRKARIMI, PB ;

MEDLIN, DL ;

MCCARTY, KF ;

BARBOUR, JC .

APPLIED PHYSICS LETTERS, 1995, 66 (21) :2813-2815

[6] FORMATION AND PROPERTIES OF CUBIC BORON-NITRIDE FILMS ON TUNGSTEN CARBIDE BY PLASMA CHEMICAL VAPOR-DEPOSITION [J].

OKAMOATO, M ;

UTSUMI, Y ;

OSAKA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (10) :3455-3460

[7] DEPOSITION OF WURTZITE TYPE BORON-NITRIDE LAYERS BY REACTIVE PULSE PLASMA CRYSTALLIZATION [J].

SOKOLOWSKI, M .

JOURNAL OF CRYSTAL GROWTH, 1979, 46 (01) :136-138

[8] Pulsed laser deposition of carbon nitride thin films from graphite targets [J].

Suda, Y ;

Nakazono, T ;

Ebihara, K ;

Baba, K ;

Aoqui, S .

CARBON, 1998, 36 (5-6) :771-774

[9]

Suda Y, 1999, J KOREAN PHYS SOC, V35, pS88

[10] Chromium carbide thin films synthesized by pulsed Nd:YAG laser deposition [J].

Suda, Y ;

Kawasaki, H ;

Terajima, R ;

Emura, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (6A) :3619-3621

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