Adatom diffusion along and down island steps

被引：15

作者：

Huang, HC ^{[1
]}

机构：

[1] Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, Troy, NY 12180 USA

来源：

JOURNAL OF COMPUTER-AIDED MATERIALS DESIGN | 2002年 / 9卷 / 01期

关键词：

D O I：

10.1023/A:1023243920865

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy-the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier - the facet-facet diffusion barrier. In this Letter, we propose another new concept - the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions.

引用

页码：75 / 80

页数：6

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