Nitrogen doping in molecular-beam epitaxy growth of II-VI semiconductors

被引:4
作者
Baron, T
Saminadayar, K
Tatarenko, S
Lugauer, HJ
Waag, A
Landwehr, G
机构
[1] CEA, SPZM, Dept Rech Fondamentale Mat Condensee, F-38054 Grenoble 9, France
[2] Univ Wurzburg, Inst Phys, D-97074 Wurzburg, Germany
关键词
D O I
10.1016/S0022-0248(97)00791-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report on the p-doping properties of the II-VI related compounds ZnTe, CdTe, BeTe and MgTe. Following a comparative study of nitrogen doping in these materials, we perceive the formation of nitride compounds as responsible for the trend observed in N-doped telluride materials. We have also investigated a possible enhanced intermixing process in CdZnMgTe/CdZnTe and ZnSe/BeTe superlattices due to nitrogen incorporation. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:415 / 418
页数:4
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