Light-output enhancement in a nitride-based light-emitting diode with 22° undercut sidewalls

被引:84
作者
Kao, CC [1 ]
Kuo, HC
Huang, HW
Chu, JT
Peng, YC
Hsieh, YL
Luo, CY
Wang, SC
Yu, CC
Lin, CF
机构
[1] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 300, Taiwan
[2] Global Union Technol Corp, Hsinchu 300, Taiwan
[3] Natl Chung Hsing Univ, Dept Mat Engn, Taichung 400, Taiwan
关键词
etching profile; GaN; light-emitting diode (LED); light extraction efficiency;
D O I
10.1109/LPT.2004.837480
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We successfully fabricated nitride-based light-emitting diodes (LEDs) with similar to 22degrees undercut sidewalls. The similar to 22degrees etching undercut sidewalls were achieved by controllable inductively coupled plasma reactive ion etching. With a 20-mA current injection, the output powers of the LED with similar to 22degrees undercut sidewalls and standard LED were 5.1 and 3 mW, respectively-a factor of 1.7 times enhancement. It was found that such undercut sidewalls could enhance the probability of escaping the photons outside from the LED in the near horizontal and in-plane directions. This simple and controllable method is beneficial to fabricate brighter LEDs.
引用
收藏
页码:19 / 21
页数:3
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