A novel design of three-aspherical-mirror imaging optics for extreme ultra-violet lithography

被引：14

作者：

Watanabe, T

Mashima, K

Niibe, M

Kinoshita, H

机构：

[1] Himeji Inst Technol, Lab Adv Sci & Technol Ind, Himeji, Hyogo 67122, Japan

[2] Nikon Corp, Opt Designing Headquarters, R&D Dept, Shinagawa Ku, Tokyo 140, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 12B期

关键词：

EUVL; lithography; multilayer; reflective mirror; aspherical mirror; imaging optics; 0.1 mu m generation;

D O I：

10.1143/JJAP.36.7597

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The demagnifying optics for extreme ultra-violet lithography (EUVL), which consists of three aspherical mirrors and one plane mirror, is proposed. A resolution of 0.1 mu m can be achieved on a ring field of 26 mm x 1mm in size and the blur size owing to the distortion is small. The assembly tolerance such as decentration tolerance and tilt tolerance is investigated for each of the aspherical mirrors. It is clarified that the assembly accuracy requires 0.0015 degree for the proposed optics.

引用

页码：7597 / 7600

页数：4

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