Influence of the quantum-well thickness on the radiative recombination of InGaN/GaN quantum well structures

被引:143
作者
Bai, J [1 ]
Wang, T
Sakai, S
机构
[1] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 7708506, Japan
[2] Univ Tokushima, Satellite Venture Business Lab, Tokushima 7708506, Japan
关键词
D O I
10.1063/1.1311831
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temperature-dependent photoluminescence (PL) measurements are performed on In0.23Ga0.77N/GaN single-quantum-well structures with different well thickness. Based on a band-tail model, the exciton localization effect is studied. The exciton localization effect is enhanced by increasing quantum-well thickness up to 2.5 nm. If the quantum-well thickness is further increased to above 2.5 nm, the exciton localization effect becomes weak. Finally, when the quantum-well thickness is increased to 5 nm, the exciton localization effect cannot be observed. In addition, the PL intensity decreases monotonically with increasing the quantum-well thickness. In connection with an excitation-power dependent PL measurement, the result of the quantum-well thickness dependent PL intensity can be attributed to quantum confined Stark effect, which becomes particularly strong in the wide quantum-well structure. Based on our optical investigation, the presented article indicates that the emission mechanism is dominated by the exciton localization effect in the thin quantum-well structures, while the quantum confined Stark effect dominates the radiative recombination in the wide quantum-well structures. Since understanding the emission mechanism is very important for further improving the performance of an InGaN/GaN-based optical device, the presented results in this article should be highly emphasized. (C) 2000 American Institute of Physics. [S0021-8979(00)02021-1].
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页码:4729 / 4733
页数:5
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