共 13 条
Ordering reduction in In0.5Ga0.5P grown by solid source molecular beam epitaxy
被引:13
作者:
Cheng, YC
[1
]
Tai, KC
Chou, ST
Huang, KF
Tu, SL
机构:
[1] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 300, Taiwan
[2] Chung Cheng Inst Technol, Dept Elect Engn, Tao Yuan 33509, Taiwan
[3] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 300, Taiwan
[4] Chung Shan Inst Sci & Technol, Mat R&D Ctr, Tao Yuan 325, Taiwan
来源:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
|
1998年
/
37卷
/
2B期
关键词:
SSMBE;
InGaP;
ordering;
SL;
polarized PL;
D O I:
10.1143/JJAP.37.L200
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In0.5Ga0.5P grown on GaAs substrates with different tilting angles by solid source molecular beam epitaxy (SSMBE) is studied. The results showed that a weak ordering effect still exists in SSMBE grown epilayers with tilted substrates. However, the ordering effect can be drastically reduced by growing In0.5Ga0.5P on a 15 degrees tilted substrate with an InAlP/InGaP superlattices (SL) buffer layer. The In0.5Ga0.5P epilayer grown by this method showed a peak photoluminescence (PL) energy of similar to 1.91 eV at room temperature, which is similar to the reported value for a fully disordered sample. The intensity of the ordering effect is characterized by polarized PL spectroscopy, and the reduction in the ordering intensity is attributed to the elimination of initial surface strain by the SL buffer layer.
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页码:L200 / L202
页数:3
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