Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

被引：7

作者：

Hozumi, A

Sugimoto, N

Sekoguchi, H

Takai, O

机构：

[1] Dept. of Mat. Processing Engineering, Nagoya University, Chikusa

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1997年 / 16卷 / 10期

基金：

日本学术振兴会;

关键词：

D O I：

10.1023/A:1018507314842

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：860 / 862

页数：3

共 23 条

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