Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography

被引：80

作者：

Paul, KE ^{[1
]}

Prentiss, M

Whitesides, GM

机构：

[1] Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA

[2] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA

来源：

ADVANCED FUNCTIONAL MATERIALS | 2003年 / 13卷 / 04期

关键词：

D O I：

10.1002/adfm.200304255

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Two soft lithographic techniques-topographically directed photolithography (TOP) and near-field contact-mode photolithograph-have been used to pattern spherical surfaces with features as small as 175 nm. Each technique has the ability to pattern more than a 60degrees arc of a spherical surface, albeit with distortions at the edge. Use as an optical polarizer demonstrates an application of these types of patterned surface.

引用

页码：259 / 263

页数：5

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