Focused electron beam induced deposition of gold

被引：143

作者：

Utke, I ^{[1
]}

Hoffmann, P

Dwir, B

Leifer, K

Kapon, E

Doppelt, P

机构：

[1] Swiss Fed Inst Technol, Microengn Dept, EPFL DMT IOA, EPFL, CH-1015 Lausanne, Switzerland

[2] Swiss Fed Inst Technol, Dept Phys, EPFL DP IMO, CH-1015 Lausanne, Switzerland

[3] CNRS, Ecole Super Phys & Chim Ind, F-75231 Paris, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期

关键词：

D O I：

10.1116/1.1319690

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Codeposition of hydrocarbons is a severe problem during focused electron beam writing of purr: metal nanostructures. When using organometallic precursors, a low metal content carbonaceous matrix embedding and separating numerous nanosized metal clusters is formed. Tn this work, we present a new and easy approach to obtain high purity gold lines: the use of inorganic PF3AuCl as a precursor. Electrical resistivities as low as 22 mu Omega cm at 295 K (ten times the bulk Au value) were obtained. This is to our knowledge the best value for focused electron beam deposition obtained from the vapor phase so far. No special care was taken to prevent hydrocarbon contamination. The deposited nanostructure consists of gold grains varying in size and percolation with beam parameters. (C) 2000 American Vacuum Society. [S0734-211X(00)06906-7].

引用

页码：3168 / 3171

页数：4

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