Nanoreplication in polymers using hot embossing and injection molding

被引：130

作者：

Schift, H ^{[1
]}

David, C

Gabriel, M

Gobrecht, J

Heyderman, LJ

Kaiser, W

Köppel, S

Scandella, L

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

[2] AWM Werkzeugbau, CH-5630 Muri AG, Switzerland

[3] Fachhsch Aargau, CH-5200 Windisch, Switzerland

[4] Netstal Maschinen AG, CH-8752 Nafels, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(00)00289-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

With polymer molding techniques, it is possible to fabricate nanostructures with a replication fidelity of 25 nanometers . Both hot embossing and injection molding can be used, and cycle times of down to 4 sec can be achieved in a CD injection molding process. The resolution is far below the structure size found today in compact disc memory media. The master structures are produced by electron beam lithography and subsequent dry etching.

引用

页码：171 / 174

页数：4

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