Ge hut cluster luminescence below bulk Ge band gap

被引:56
作者
Denker, U
Stoffel, M
Schmidt, OG
Sigg, H
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
[2] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
关键词
D O I
10.1063/1.1537437
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the photoluminescence (PL) properties of Ge hut cluster islands on Si(001) that were overgrown at temperatures as low as 250 degreesC. We find that the island-related photoluminescence systematically redshifts as the overgrowth temperature is reduced from 500 to 360 degreesC, which is attributed to a reduced Ge segregation. For even lower overgrowth temperatures, the emission energy saturates at 0.63 eV or 1.96 mum, more than 110 meV smaller than the band gap of unstrained bulk Ge. We report a PL peak centered at 2.01 mum at low excitation power, in good agreement with the estimated transition energy for a spatially indirect transition between holes confined in the strained Ge island and electrons confined in the surrounding Si matrix. PL is observed up to a temperature of 185 K and an activation energy of 40 meV is deduced from fitting the temperature-dependent peak intensity. Annealing experiments reveal a systematic blueshift of the hut cluster-related PL, thus verifying unambiguously, that the PL signal originates from the hut clusters and not from defects. (C) 2003 American Institute of Physics.
引用
收藏
页码:454 / 456
页数:3
相关论文
共 27 条
[1]   TYPE-II BAND ALIGNMENT IN SI/SI1-XGEX QUANTUM-WELLS FROM PHOTOLUMINESCENCE LINE SHIFTS DUE TO OPTICALLY INDUCED BAND-BENDING EFFECTS - EXPERIMENT AND THEORY [J].
BAIER, T ;
MANTZ, U ;
THONKE, K ;
SAUER, R ;
SCHAFFLER, F ;
HERZOG, HJ .
PHYSICAL REVIEW B, 1994, 50 (20) :15191-15196
[2]   Surface segregation of Ge at SiGe(001) by concerted exchange pathways [J].
Boguslawski, P ;
Bernholc, J .
PHYSICAL REVIEW LETTERS, 2002, 88 (16) :4-166101
[3]   SiGe intermixing in Ge/Si(100) islands [J].
Capellini, G ;
De Seta, M ;
Evangelisti, F .
APPLIED PHYSICS LETTERS, 2001, 78 (03) :303-305
[4]   Photoluminescence investigation of phononless radiative recombination and thermal-stability of germanium hut clusters on silicon(001) [J].
Dashiell, MW ;
Denker, U ;
Schmidt, OG .
APPLIED PHYSICS LETTERS, 2001, 79 (14) :2261-2263
[5]   Surface smoothing induced by epitaxial Si capping of rough and strained Ge or Si1-xGex morphologies:: a RHEED and TEM study [J].
Dentel, D ;
Bischoff, JL ;
Kubler, L ;
Werckmann, J ;
Romeo, M .
JOURNAL OF CRYSTAL GROWTH, 1998, 191 (04) :697-710
[6]   Electronic structure of Ge/Si quantum dots [J].
Dvurechenskii, AV ;
Nenashev, AV ;
Yakimov, AI .
NANOTECHNOLOGY, 2002, 13 (01) :75-80
[7]   Phononless radiative recombination of indirect excitons in a Si/Ge type-II quantum dot [J].
Fukatsu, S ;
Sunamura, H ;
Shiraki, Y ;
Komiyama, S .
APPLIED PHYSICS LETTERS, 1997, 71 (02) :258-260
[8]   Si overgrowth of self-assembled Ge clusters on Si(001) -: a scanning tunnelling microscopy study [J].
Kummer, M ;
Vögeli, B ;
von Känel, H .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 69 :247-250
[9]   Intra-valence band photocurrent measurements on Ge quantum dots in Si [J].
Miesner, C ;
Brunner, K ;
Abstreiter, G .
THIN SOLID FILMS, 2000, 380 (1-2) :180-182
[10]  
MO YW, 1990, PHYS REV LETT, V65, P1020, DOI 10.1142/S0217984990001732