Measuring the capacitance of individual semiconductor nanowires for carrier mobility assessment

被引:66
作者
Tu, Ryan
Zhang, Li
Nishi, Yoshio
Dai, Hongjie [1 ]
机构
[1] Stanford Univ, Dept Chem, Stanford, CA 94305 USA
[2] Stanford Univ, Adv Mat Lab, Stanford, CA 94305 USA
[3] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[4] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
关键词
D O I
10.1021/nl070378w
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Capacitance-voltage characteristics of individual germanium nanowire field effect transistors were directly measured and used to assess carrier mobility in nanowires for the first time, thereby removing uncertainties in calculated mobility due to device geometries, surface and interface states, and gate dielectric constants and thicknesses. Direct experimental evidence showed that surround-gated nanowire transistors exhibit higher capacitance and better electrostatic gate control than top-gated devices, and are the most promising structure for future high performance nanoelectronics.
引用
收藏
页码:1561 / 1565
页数:5
相关论文
共 17 条
[1]   Vertical high-mobility wrap-gated InAs nanowire transistor [J].
Bryllert, T ;
Wernersson, LE ;
Fröberg, LE ;
Samuelson, L .
IEEE ELECTRON DEVICE LETTERS, 2006, 27 (05) :323-325
[2]   High performance silicon nanowire field effect transistors [J].
Cui, Y ;
Zhong, ZH ;
Wang, DL ;
Wang, WU ;
Lieber, CM .
NANO LETTERS, 2003, 3 (02) :149-152
[3]   Growth and transport properties of complementary germanium nanowire field-effect transistors [J].
Greytak, AB ;
Lauhon, LJ ;
Gudiksen, MS ;
Lieber, CM .
APPLIED PHYSICS LETTERS, 2004, 84 (21) :4176-4178
[4]   Measurement of the quantum capacitance of interacting electrons in carbon nanotubes [J].
Ilani, S. ;
Donev, L. A. K. ;
Kindermann, M. ;
McEuen, P. L. .
NATURE PHYSICS, 2006, 2 (10) :687-691
[5]   High-κ dielectrics for advanced carbon-nanotube transistors and logic gates [J].
Javey, A ;
Kim, H ;
Brink, M ;
Wang, Q ;
Ural, A ;
Guo, J ;
McIntyre, P ;
McEuen, P ;
Lundstrom, M ;
Dai, HJ .
NATURE MATERIALS, 2002, 1 (04) :241-246
[6]   Essential physics of carrier transport in nanoscale MOSFETs [J].
Lundstrom, M ;
Ren, ZB .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (01) :133-141
[7]   Low dielectric constant materials for microelectronics [J].
Maex, K ;
Baklanov, MR ;
Shamiryan, D ;
Iacopi, F ;
Brongersma, SH ;
Yanovitskaya, ZS .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) :8793-8841
[8]   P-CHANNEL GERMANIUM MOSFETS WITH HIGH CHANNEL MOBILITY [J].
MARTIN, SC ;
HITT, LM ;
ROSENBERG, JJ .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (07) :325-326
[9]   Sputter deposition for semiconductor manufacturing [J].
Rossnagel, SM .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1999, 43 (1-2) :163-179
[10]   Electrical characterization of germanium p-channel MOSFETs [J].
Shang, H ;
Okorn-Schimdt, H ;
Ott, J ;
Kozlowski, P ;
Steen, S ;
Jones, EC ;
Wong, HSP ;
Hanesch, W .
IEEE ELECTRON DEVICE LETTERS, 2003, 24 (04) :242-244