Characterization of nanometer-sized dendritic form structures fabricated on insulator substrates with an electron-beam-induced deposition in a TEM

被引:7
作者
Song, M [1 ]
Mitsuishi, K [1 ]
Takeguchi, M [1 ]
Furuya, K [1 ]
机构
[1] Natl Inst Mat Sci, High Voltage Electron Microscopy Stn, Tsukuba, Ibaraki 3050003, Japan
关键词
electron-beam-induced deposition; TEM; nanostructure; dendrite; nanofabrication;
D O I
10.1016/j.apsusc.2004.09.026
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Nanometer-sized dendrite-like structures with a designed element, W, is fabricated on an insulator substrate, Al2O3, with an electron-beam-induced decomposition (EBID) in a transmission electron microscope (TEM). The fabricated structures are characterized with convention and high resolution TEM. The dendritic structure with tips in about 3 nm grows radially at convex surface of a substrate. The bcc structural W crystal grains in nanometers are composed in the dendrites. A mechanism is proposed to explain the growth and morphology of the deposit involving a charge-up on surface, a movement to and an accumulation of charges at convex surface or tips of substrate or the branched deposit. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:107 / 112
页数:6
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