High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers

被引:34
作者
Ali, Kamran [1 ]
Choi, Kyung-Hyun [1 ]
Jo, Jeongdai [2 ]
Lee, Yun Woo [1 ]
机构
[1] Jeju Natl Univ, Dept Mechatron Engn, Cheju 690756, South Korea
[2] Korean Inst Machinery & Mat, Taejon 305343, South Korea
关键词
Roll-to-roll atomic layer deposition; Barrier; Atmospheric; Al2O3; PET; ALUMINUM-OXIDE; CA TEST; PASSIVATION; COATINGS; ZNO;
D O I
10.1016/j.matlet.2014.07.186
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50 degrees C under the working pressure of 740 Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and 0 1s at the binding energies of 74 eV, 119 eV and 531 eV, respectively. On the basis of MOCON test instrument, water permeation values of the range similar to 10(-3) g/m(2)/day at 37.8 degrees C/100% relative humidity have been observed for Al2O3 films with a thickness of 15 nm to 40 nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:90 / 94
页数:5
相关论文
共 31 条
[1]   Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment [J].
Ali, Kamran ;
Choi, Kyung-Hyun ;
Kim, Chang Young ;
Doh, Yang Hoi ;
Jo, Jeongdai .
APPLIED SURFACE SCIENCE, 2014, 305 :554-561
[2]   Characterization of Al2O3 thin films fabricated through atomic layer deposition on polymeric substrates [J].
Ali, Kamran ;
Kim, Chang Young ;
Choi, Kyung-Hyun .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2014, 25 (04) :1922-1932
[3]   ZrO2 flexible printed resistive (memristive) switch through electrohydrodynamic printing process [J].
Awais, Muhammad Naeem ;
Kim, Hyung Chan ;
Doh, Yang Hui ;
Choi, Kyung Hyun .
THIN SOLID FILMS, 2013, 536 :308-312
[4]   Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition [J].
Beetstra, Renske ;
Lafont, Ugo ;
Nijenhuis, John ;
Kelder, Erik M. ;
van Ommen, J. Ruud .
CHEMICAL VAPOR DEPOSITION, 2009, 15 (7-9) :227-233
[5]   H2O Vapor Transmission Rate through Polyethylene Naphtha late Polymer Using the Electrical Ca Test [J].
Bertrand, J. A. ;
Higgs, D. J. ;
Young, M. J. ;
George, S. M. .
JOURNAL OF PHYSICAL CHEMISTRY A, 2013, 117 (46) :12026-12034
[6]   Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers [J].
Carcia, P. F. ;
McLean, R. S. ;
Reilly, M. H. ;
Groner, M. D. ;
George, S. M. .
APPLIED PHYSICS LETTERS, 2006, 89 (03)
[7]   Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition [J].
Carcia, P. F. ;
McLean, R. S. ;
Groner, M. D. ;
Dameron, A. A. ;
George, S. M. .
JOURNAL OF APPLIED PHYSICS, 2009, 106 (02)
[8]   Investigation of electrostatic atomization of a conjugated polymer (poly[2-methoxy-5-(2′-ethylhexyloxy)-(p-phenylenevinylene)]) and its film characterization for organic diode applications [J].
Choi, Kyung-Hyun ;
Mustafa, Maria ;
Ko, Jeong-Beom ;
Doh, Yang-Hoi .
THIN SOLID FILMS, 2012, 525 :40-44
[9]   Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics [J].
Choi, Y. -H. ;
Bulliard, X. ;
Benayad, A. ;
Leterrier, Y. ;
Manson, J. -A. E. ;
Lee, K. -H. ;
Choi, D. ;
Park, J. -J. ;
Kim, J. .
ACTA MATERIALIA, 2010, 58 (19) :6495-6503
[10]   Homogeneous Al2O3 multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation [J].
Choi, Yun-Hyuk ;
Lee, Young Gu ;
Bulliard, Xavier ;
Lee, Kwang-Hee ;
Lee, Sangyoon ;
Choi, Dukhyun ;
Park, Jong-Jin ;
Kim, Jong Min .
SCRIPTA MATERIALIA, 2010, 62 (07) :447-450