Comparison of dilute nitride growth on a single- and 8x4-inch multiwafer MOVPE system for solar cell applications

被引:27
作者
Dimroth, F
Baur, C
Bett, AW
Volz, K
Stolz, W
机构
[1] Fraunhofer Inst Solar Energy Syst, D-79110 Freiburg, Germany
[2] Univ Marburg, Ctr Mat Sci, D-35032 Marburg, Germany
关键词
metalorganic vapor-phase epitaxy; organometallic vapor-phase epitaxy; nitrides; semiconducting III-Vmaterials; solar cells;
D O I
10.1016/j.jcrysgro.2004.08.038
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The dilute nitrides like (GaIn)(NAs) or Ga(NAsSb) are attractive materials for the next generation of photovoltaic cells with four to six active junctions. Unfortunately, these compounds suffer from a low minority carrier diffusion length. This can be partially compensated by choosing suitable device structures with a reduced prerequisite on the necessary current density. (GaIn)(NAs) solar cells with a bandgap between 1.0 and 1.2 eV have been grown by metal organic vapor-phase epitaxy on single- and 8 x 4-in multiwafer reactors. Short-circuit current densities up to 10.9 mA/cm(2) (AM0) have been achieved for a (GaIn)(NAs) cell filtered with GaAs. This excellent value is sufficient for the application in five- or six-junction photovoltaic cells. Challenges are resulting from the transfer of growth conditions to a production size multi-wafer MOVPE reactor, which are discussed in this paper. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:726 / 731
页数:6
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