DIRECT WRITING OF SILICON LINES BY PYROLYTIC ARGON-LASER CVD

被引：5

作者：

ISHIZU, A ^{[1
]}

INOUE, Y ^{[1
]}

NISHIMURA, T ^{[1
]}

AKASAKA, Y ^{[1
]}

MIKI, H ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP, LSI RES & DEV LAB, ITAMI, HYOGO 664, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1986年 / 25卷 / 12期

关键词：

D O I：

10.1143/JJAP.25.1830

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1830 / 1833

页数：4

共 6 条

[1]

EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[2] LASER MICROCHEMICAL TECHNIQUES FOR REVERSIBLE RESTRUCTURING OF GATE-ARRAY PROTOTYPE CIRCUITS [J].

EHRLICH, DJ ;

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SEDLACEK, JHC ;

MOUNTAIN, RW ;

GRABER, WS .

IEEE ELECTRON DEVICE LETTERS, 1984, 5 (02) :32-35

[3]

EHRLICH DJ, 1981, APPL PHYS LETT, V39, P957, DOI 10.1063/1.92624

[4] ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITION [J].

EHRLICH, DJ ;

OSGOOD, RM ;

SILVERSMITH, DJ ;

DEUTSCH, TF .

ELECTRON DEVICE LETTERS, 1980, 1 (06) :101-103

[5] LASER-INDUCED SELECTIVE DEPOSITION OF MICRON-SIZE STRUCTURES ON SILICON [J].

LIU, YS ;

YAKYMYSHYN, CP ;

PHILIPP, HR ;

COLE, HS ;

LEVINSON, LM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05) :1441-1444

[6] WAFER-SCALE LASER PANTOGRAPHY .3. FABRICATION OF NORMAL-METAL-OXIDE-SEMICONDUCTOR TRANSISTORS AND SMALL-SCALE INTEGRATED-CIRCUITS BY DIRECT-WRITE LASER-INDUCED PYROLYTIC REACTIONS [J].

MCWILLIAMS, BM ;

HERMAN, IP ;

MITLITSKY, F ;

HYDE, RA ;

WOOD, LL .

APPLIED PHYSICS LETTERS, 1983, 43 (10) :946-948

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