NITROCELLULOSE AS A SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY

被引：41

作者：

GEIS, MW

RANDALL, JN

DEUTSCH, TF

EFREMOW, NN

DONNELLY, JP

WOODHOUSE, JD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582756

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1178 / 1181

页数：4

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