PROPERTIES OF MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS ALLOYED WITH GERMANIUM

被引：3

作者：

SAITO, N

TERADA, T

YAMAGUCHI, T

机构：

[1] Shizuoka Univ, Hamamatsu, Jpn, Shizuoka Univ, Hamamatsu, Jpn

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1986年 / 83卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(86)90055-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

FILMS

引用

页码：42 / 48

页数：7

共 20 条

[1] PROPERTIES OF RF SPUTTERED HYDROGENATED AMORPHOUS GERMANIUM-SILICON ALLOYS
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[2] ALLOYING EFFECTS ON THE OPTICAL-ABSORPTION EDGE OF GLOW-DISCHARGE A-SI1-XGEX-H
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[5] GAP STATE DISTRIBUTION OF HYDROGENATED AMORPHOUS SILICON-GERMANIUM ALLOYS
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[6] SPONTANEOUS INCLUSION OF OXYGEN IN SPUTTER-DEPOSITED AMORPHOUS-SILICON DURING AND AFTER FABRICATION
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[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (02) : L65 - L68
[7] NMR AND ELECTRON-SPIN-RESONANCE STUDIES ON A-SI1-XGEX-H PREPARED BY MAGNETRON SPUTTERING
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SHIMIZU, T
[J]. SOLID STATE COMMUNICATIONS, 1985, 55 (05) : 409 - 412
[8] CHEMICAL BONDING OF HYDROGEN AND OXYGEN IN GLOW-DISCHARGE - DEPOSITED THIN-FILMS OF A-GE-H AND A-GE-(H,O)
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CHAO, SS
YANG, J
TYLER, JE
ROSS, RC
CZUBATYJ, W
[J]. PHYSICAL REVIEW B, 1985, 31 (04): : 2190 - 2197
[9] STRUCTURAL, ELECTRICAL, AND OPTICAL-PROPERTIES OF A-SI1-XGEX-H AND AN INFERRED ELECTRONIC BAND-STRUCTURE
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EGGERT, JR
LEOPOLD, DJ
LI, YM
LIN, S
PAUL, W
[J]. PHYSICAL REVIEW B, 1985, 31 (04): : 2198 - 2212
[10] MODDEL G, 1981, AIP C P, V73, P25

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