OXIDE THICKNESS MEASUREMENTS BY IR ELLIPSOMETRY

被引：4

作者：

ALLEN, TH

SUNDERLAND, RJ

机构：

[1] DOUGLAS AIRCRAFT CO,LONG BEACH,CA

[2] MCDONNELL DOUGLAS CORP,ST LOUIS,MO 63166

来源：

THIN SOLID FILMS | 1977年 / 45卷 / 01期

关键词：

D O I：

10.1016/0040-6090(77)90222-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：169 / 182

页数：14

共 9 条

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[2]

ARCHER RJ, 1968, ELLIPSOMETRY, P13

[3] AUGER ELECTRON SPECTROSCOPY [J].

CHANG, CC .

SURFACE SCIENCE, 1971, 25 (01) :53-+

[4] EPITAXIAL LAYER THICKNESS MEASUREMENT BY FAR INFRARED ELLIPSOMETRY [J].

DENICOLA, RO ;

SAIFI, MA ;

FRAZEE, RE .

APPLIED OPTICS, 1972, 11 (11) :2534-&

[5] ERRORS ARISING FROM SURFACE ROUGHNESS IN ELLIPSOMETRIC MEASUREMENT OF REFRACTIVE INDEX OF A SURFACE [J].

FENSTERMAKER, CA ;

MCCRACKIN, FL .

SURFACE SCIENCE, 1969, 16 :85-+

[6]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[7] A SOLEIL COMPENSATOR FOR FAR INFRARED [J].

PALIK, ED .

APPLIED OPTICS, 1965, 4 (08) :1017-&

[8] OPTICAL CONSTANTS OF ROUGH SURFACE BY ELLIPSOMETRY [J].

SIROHI, RS .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1970, 3 (09) :1407-&

[9]

VASICEK A, 1960, OPTICS THIN FILMS, P289

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