OXIDE THICKNESS MEASUREMENTS BY IR ELLIPSOMETRY

被引:4
作者
ALLEN, TH
SUNDERLAND, RJ
机构
[1] DOUGLAS AIRCRAFT CO,LONG BEACH,CA
[2] MCDONNELL DOUGLAS CORP,ST LOUIS,MO 63166
关键词
D O I
10.1016/0040-6090(77)90222-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:169 / 182
页数:14
相关论文
共 9 条
[1]   STUDY OF AL WITH A COMBINED AUGER-ELECTRON SPECTROMETER-ELLIPSOMETER SYSTEM [J].
ALLEN, TH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :112-115
[2]  
ARCHER RJ, 1968, ELLIPSOMETRY, P13
[3]   AUGER ELECTRON SPECTROSCOPY [J].
CHANG, CC .
SURFACE SCIENCE, 1971, 25 (01) :53-+
[4]   EPITAXIAL LAYER THICKNESS MEASUREMENT BY FAR INFRARED ELLIPSOMETRY [J].
DENICOLA, RO ;
SAIFI, MA ;
FRAZEE, RE .
APPLIED OPTICS, 1972, 11 (11) :2534-&
[5]   ERRORS ARISING FROM SURFACE ROUGHNESS IN ELLIPSOMETRIC MEASUREMENT OF REFRACTIVE INDEX OF A SURFACE [J].
FENSTERMAKER, CA ;
MCCRACKIN, FL .
SURFACE SCIENCE, 1969, 16 :85-+
[6]  
Maissel L.I., 1970, HDB THIN FILM TECHNO
[7]   A SOLEIL COMPENSATOR FOR FAR INFRARED [J].
PALIK, ED .
APPLIED OPTICS, 1965, 4 (08) :1017-&
[8]   OPTICAL CONSTANTS OF ROUGH SURFACE BY ELLIPSOMETRY [J].
SIROHI, RS .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1970, 3 (09) :1407-&
[9]  
VASICEK A, 1960, OPTICS THIN FILMS, P289