EPITAXIAL LAYER THICKNESS MEASUREMENT BY FAR INFRARED ELLIPSOMETRY

被引：7

作者：

DENICOLA, RO

SAIFI, MA

FRAZEE, RE

机构：

来源：

APPLIED OPTICS | 1972年 / 11卷 / 11期

关键词：

D O I：

10.1364/AO.11.002534

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2534 / &

共 18 条

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[2]

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HILTON, AR ;

JONES, CE .

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[8] OPTICAL PROPERTIES BY FAR INFRARED ELLIPSOMETRY [J].

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HILTON, AR .

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[9] A SPREADING RESISTANCE TECHNIQUE FOR RESISTIVITY MEASUREMENTS ON SILICON [J].

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