LOCAL EPITAXY OF TISI2 ON (111)SI - EFFECTS DUE TO RAPID THERMAL ANNEALING AND TO THE ANNEALING ATMOSPHERE

被引：30

作者：

WU, IC

CHU, JJ

CHEN, LJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 09期

关键词：

D O I：

10.1063/1.337731

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3172 / 3175

页数：4

共 28 条

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