MICROPATTERN MEASUREMENT WITH AN ATOMIC FORCE MICROSCOPE

被引：39

作者：

FUJII, T ^{[1
]}

SUZUKI, M ^{[1
]}

MIYASHITA, M ^{[1
]}

YAMAGUCHI, M ^{[1
]}

ONUKI, T ^{[1
]}

NAKAMURA, H ^{[1
]}

MATSUBARA, T ^{[1
]}

YAMADA, H ^{[1
]}

NAKAYAMA, K ^{[1
]}

机构：

[1] NATL RES LAB METEROL,TSUKUBA 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 02期

关键词：

D O I：

10.1116/1.585483

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The atomic force microscope (AFM) can profile both the surfaces of conductors and insulators with nanometer resolution. One of the most promising applications of the AFM is micropattern measurement of semiconductor devices such as linwidth. An AFM with high precision positioning stages using monolithic, parallel spring mechanisms with flexture hinges has been applied to the measurement of nonconducting surfaces. The X-Y scanner is equipped with the two-dimensional optical interferometer to measure displacements of the scanner. The sensing lever is a microfabricated V-shaped Si3N4 cantilever with a tip made using electron beam deposition. Distortion-free images of a polycarbonate compact disk nonconducting surfaces with details around the pits have been successfully obtained.

引用

页码：666 / 669

页数：4

共 13 条

[1] NEW SCANNING TUNNELING MICROSCOPY TIP FOR MEASURING SURFACE-TOPOGRAPHY [J].