SELECTIVE ELECTROLESS METAL-DEPOSITION FOR INTEGRATED-CIRCUIT FABRICATION

被引：108

作者：

TING, CH

PAUNOVIC, M

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 02期

关键词：

D O I：

10.1149/1.2096654

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：456 / 462

页数：7

共 22 条

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