PREPARATION AND PROPERTIES OF AL2O3 FILMS BY DC AND RF MAGNETRON SPUTTERING

被引：43

作者：

DESHPANDEY, C ^{[1
]}

HOLLAND, L ^{[1
]}

机构：

[1] UNIV SUSSEX,PLASMA MAT PROC UNIT,BRIGHTON BN1 9RH,E SUSSEX,ENGLAND

来源：

THIN SOLID FILMS | 1982年 / 96卷 / 03期

关键词：

D O I：

10.1016/0040-6090(82)90251-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：265 / 270

页数：6

共 17 条

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[3]

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[4]

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[6] DIRECT-CURRENT REACTIVE SPUTTERING OF ALUMINUM [J].

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ORLINOV, V ;

TSANEVA, V ;

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[7]

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[8] TUNNEL MAGNETRON CHARACTERISTICS AND DISCHARGE DIAGNOSTICS [J].

HOLLAND, L .

THIN SOLID FILMS, 1981, 86 (2-3) :227-239

[9] SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS [J].

HOLLAND, L ;

SAMUEL, G .

VACUUM, 1980, 30 (07) :267-274

[10]

HOLLAND L, 1956, VACUUM DEPOSITION TH

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